Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Author(s):

Murakami, K. ( Association of Super-Advanced Electronics Technologies (Japan) )

Saito, J. ( Association of Super-Advanced Electronics Technologies (Japan) )

Ota, K. ( Association of Super-Advanced Electronics Technologies (Japan) )

Kondo, H. ( Association of Super-Advanced Electronics Technologies (Japan) )

Ishii, M. ( Association of Super-Advanced Electronics Technologies (Japan) )

Kawakami, J. ( Association of Super-Advanced Electronics Technologies (Japan) )

Oshino, T. ( Association of Super-Advanced Electronics Technologies (Japan) )

Sugisaki, K. ( Association of Super-Advanced Electronics Technologies (Japan) )

Zhu, Y. ( Association of Super-Advanced Electronics Technologies (Japan) )

Hasegawa, M. ( Association of Super-Advanced Electronics Technologies (Japan) )

Sekine, Y. ( Association of Super-Advanced Electronics Technologies (Japan) )

Takeuchi, S. ( Association of Super-Advanced Electronics Technologies (Japan) )

Ouchi, C. ( Association of Super-Advanced Electronics Technologies (Japan) )

Kakuchi, O. ( Association of Super-Advanced Electronics Technologies (Japan) )

Watanabe, Y. ( Association of Super-Advanced Electronics Technologies (Japan) )

Hasegawa, T. ( Association of Super-Advanced Electronics Technologies (Japan) )

Hara, S. ( Association of Super-Advanced Electronics Technologies (Japan) )

Suzuki, A. ( Association of Super-Advanced Electronics Technologies (Japan) )

13 more

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

1

Pt.:

Session 8

Page(from):

257

Page(to):

264

Pages:

8

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings

Details

TDL ID:	ZA00013023
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2003 : 7th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.25-2003.02.27
Note for article:	Session 8. EUV Metrology/Mirrors ; 5037-36

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