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Implementing flare compensation for EUV masks through localized mask CD resizing

Author(s):
Krautschik, C.G. ( Association of Super-Advanced Electronics Technology (Japan) )
Chandhok, M. ( Intel Corp. (USA) )
Zhang, G. ( Intel Corp. (USA) )
Lee, S.H. ( Intel Corp. (USA) )
Goldstein, M. ( Intel Corp. (USA) )
Panning, E.M. ( Intel Corp. (USA) )
Rice, B.J. ( Intel Corp. (USA) )
Bristol, R.L. ( Intel Corp. (USA) )
Singh, V. ( Intel Corp. (USA) )
4 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
1
Pt.:
Session 2
Page(from):
58
Page(to):
68
Pages:
11
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

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