System and process learning in a full-field, high-power EUVL alpha tool

System and process learning in a full-field, high-power EUVL alpha tool

Author(s):

Ballard, W.P. ( Sandia National Labs. (USA) )

Tichenor, D.A. ( Sandia National Labs. (USA) )

O'Connell, D.J. ( Sandia National Labs. (USA) )

II, L.J.B. ( Sandia National Labs. (USA) )

Lafon, R.E. ( W. M. Keck Observatory (USA) )

Anderson, R.J.M. ( Sandia National Labs. (USA) )

Leung, A.H. ( Sandia National Labs. (USA) )

Williams, K.A. ( Sandia National Labs. (USA) )

Haney, S.J. ( Sandia National Labs. (USA) )

Perras, Y.E. ( Sandia National Labs. (USA) )

Jefferson, K.L. ( Sandia National Labs. (USA) )

Porter, T.L. ( Sandia National Labs. (USA) )

Knight, D. ( Sandia National Labs. (USA) )

Barr, P.K. ( Sandia National Labs. (USA) )

Vreugde, J.L.V. ( Sandia National Labs. (USA) )

Campiotti, R.H. ( Sandia National Labs. (USA) )

Zimmerman, M.D. ( Sandia National Labs. (USA) )

Johnson, T.A. ( Sandia National Labs. (USA) )

Klebanoff, L.E. ( Sandia National Labs. (USA) )

Grunow, P.A. ( Sandia National Labs. (USA) )

Graham, S. Jr., ( Sandia National Labs. (USA) )

Buchenauer, D.A. ( Sandia National Labs. (USA) )

Replogle, W.C. ( Sandia National Labs. (USA) )

Smith, T.G. ( Sandia National Labs. (USA) )

Wronosky, J.B. ( Sandia National Labs. (USA) )

Darnold, J.R. ( Sandia National Labs. (USA) )

Blaedel, K.L. ( Lawrence Berkeley National Lab. (USA) )

Chapman, H.N. ( Lawrence Berkeley National Lab. (USA) )

Taylor, J.S. ( Lawrence Berkeley National Lab. (USA) )

Hale, L.C. ( Lawrence Berkeley National Lab. (USA) )

Sommargren, G.E. ( Lawrence Berkeley National Lab. (USA) )

Gullikson, E.M. ( Lawrence Livermore National Lab. (USA) )

Naulleau, P.P. ( Lawrence Livermore National Lab. (USA) )

Goldberg, K.A. ( Lawrence Livermore National Lab. (USA) )

Lee, S.H. ( Intel Corp. (USA) )

Shields, H. ( TRW, Inc. (USA) )

Pierre, R.J.S. ( Cutting Edge Optronics, Inc. (USA) )

Ponti, S. ( Cutting Edge Optronics, Inc. (USA) )

33 more

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

1

Pt.:

Session 2

Page(from):

47

Page(to):

57

Pages:

11

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings

Details

TDL ID:	ZA00013023
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2003 : 7th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.25-2003.02.27
Note for article:	Session 2. EUV Systems/Overview ; 5037-06

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