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Low-temperature plasma-deposited microcrystalline silicon thin films: an emerging material for stable thin film transistors

Author(s):
Cabarrocas, P.R. ( CNRS-Lab. de Physique des Interfaces et des Couches Minces (France) )
Kasouit, S. ( CNRS-Lab. de Physique des Interfaces et des Couches Minces (France) )
Kalache, B. ( CNRS-Lab. de Physique des Interfaces et des Couches Minces (France) )
Vanderhaghen, R. ( CNRS-Lab. de Physique des Interfaces et des Couches Minces (France) )
Bonnassieux, Y. ( CNRS-Lab. de Physique des Interfaces et des Couches Minces (France) )
Elyaakoubi, M. ( UNAXIS France SA (France) )
French, I.D. ( Philips Research Labs. (United Kingdom) )
2 more
Publication title:
Poly-Silicon Thin Film Transistor Technology and Applications in Displays and Other Novel Technology Areas
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5004
Pub. date:
2003
Page(from):
84
Page(to):
94
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448040 [0819448044]
Language:
English
Call no.:
P63600/5004
Type:
Conference Proceedings

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