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Chemical dry cleaning and pretreatment on the electrical and reliability characteristic of high-k gate dielectrics in MOS device (Invited Paper)

Author(s):
Publication title:
Quantum Sensing: Evolution and Revolution from Past to Future
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4999
Pub. date:
2003
Page(from):
299
Page(to):
306
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819447999 [0819447994]
Language:
English
Call no.:
P63600/4999
Type:
Conference Proceedings

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