Material optimization of Er3 + :Y2SiO5 at 1.5 μm for optical processing, memory, and laser frequency stabilization applications

Material optimization of Er3 + :Y2SiO5 at 1.5 μm for optical processing, memory, and laser frequency stabilization applications

Author(s):

Boettger, T. ( Montana State Univ./Bozeman (USA) )
Sun, Y. ( Montana State Univ./Bozeman (USA) )
Thiel, C.W. ( Montana State Univ./Bozeman (USA) )
Cone, R.L. ( Montana State Univ./Bozeman (USA) )

Publication title:

Advanced optical data storage : 28-29 January 2003, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4988

Pub. Year:

2003

Page(from):

51

Page(to):

61

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819447883 [0819447889]

Language:

English

Call no.:

P63600/4988

Type:

Conference Proceedings

Details

TDL ID:	ZA00012971
Series ID:	PA00000029
Conf. info. (Name):	Photonics West - Optoelectronic Materials and Devices : Advanced optical data storage
Conf. info. (Number):	2003
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2003.01.28-2003.01.29

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