Blank Cover Image

Zone-plate-array lithography (ZPL): a maskless fast-turn-around system for microoptic device fabrication (Invited Paper)

Author(s):
  • Menon, R. ( Massachusetts Institute of Technology (USA) )
  • Gil, D. ( Massachusetts Institute of Technology (USA) )
  • Carter, D.J.D. ( Charles Stark Draper Labs., Inc. (USA) )
  • Patel, A. ( Massachusetts Institute of Technology (USA) )
  • Smith, H.I. ( Massachusetts Institute of Technology (USA) )
Publication title:
Micromachining Technology for Micro-Optics and Nano-Optics
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4984
Pub. Year:
2003
Page(from):
10
Page(to):
17
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819447845 [0819447846]
Language:
English
Call no.:
P63600/4984
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Zone-plate array lithography(ZPAL):a new maskless approach

Carter,D.J.D., Gil,D., Menon,R., Djomehri,I.J., Smith,H.L.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Optimal zone plates for x-ray lithography

Allain, J. P., Hassanein, A., Nieto, M., Titov, V., Plotkin, P., Hinson, E., Rice, B. J., Bristol, R., Rokusek, D., …

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Maskless optical lithography using MEMS-based spatial light modulators (Invited Paper)

Menon, R., Patel, A., Smith, H.I.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Slow and fast light in coupled mieroresonators (Invited Paper)

Chang, H., Smith, D.D., Fuller, K.A., Dimmock, J.O., Gregory, D.A., Frazier, D.O.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Sub-40-nm pattern replication with ｡ﾞ20% process latitude by soft-contact x-ray lithography

Carter,D.J.D., Smith,H.I., Rhee,K.W., Marrian,C.R.

SPIE - The International Society for Optical Engineering
9 Conference Proceedings Fabrication and Magnetic Properties of Arrays of Electrodeposited Cylinders

Parrochon, J.U.C., Escoffier, W, Smith, H.I., Ross, C.A., Schwarzacher, W.

Electrochemical Society
4 Conference Proceedings Zone-plate-array lithography (ZPAL): optical maskless lithography for cost-effective patterning

Rettig, C. L., Khodykin, O. V., Hoffman, J. R., Marx, W. F., Bowering, N. R., Vargas, E., Ershov, A. I., Fomenkov, I. …

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Enabling nanoscale science and engineering via highly flexible low-cost maskless klithography (Keynote Address) [6002-12]

Menon R., Patel A., Chao D., Walsh M., Barbastathish G.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings *Soft X-rays for deep sub-100 nm lithography, with and without masks

Smith, Henry I., Carter, D. J.D., Ferrera, J., Gil, D., Goodberlet, J., Hastings, J. T., Lim, M. H., Meinhold, M., …

MRS-Materials Research Society
11 Conference Proceedings Optical MEMS devices for telecom systems (Invited Paper)

Pardo, F., Aksyuk, V.A., Arney, S., Bair, H., Basavanhally, N.R., Bishop, D.J., Bogart, G.R., Bolle, C.A., Bower, J.E., …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Proposal for a distributed parallel system for high-throughput maskless e-beam lithography(Invited Paper)

Groves, T. R., Pickard, D. S.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Two-dimensional MEMS array for maskless lithography and wavefront modulation

D. Lopez, V. A. Aksyuk, G. P. Watson, W. M. Mansfield, R. Cirelli, F. Klemens, F. Pardo, E. Ferry, J. Miner, T. W. …

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12