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Behaviors of free electrons and shallow-trapped eletrons in sulfer-sensitized silvur halide material

Author(s):
Publication title:
Color science and imaging technologies : 16-17 October, 2002, Shanghai, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4922
Pub. Year:
2002
Page(from):
131
Page(to):
135
Pages:
5
Pub. info.:
Bellingham, Washington: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819447111 [0819447110]
Language:
English
Call no.:
P63600/4922
Type:
Conference Proceedings

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