Characteristics of an EDFA gain flattening filter formed after a double exposure

Characteristics of an EDFA gain flattening filter formed after a double exposure

Author(s):

Yoon, H.D. ( Korea Electronics Technology Institute )

Park, J.H. ( Hirose Korea Co., Ltd. )

Park, K.S.

Cho, J.Y. ( Sung Kyun Kwan Univ. (Korea) )

Jang, H.S.

Lee, K.S.

1 more

Publication title:

Optical components and transmission systems : APOC 2002 : Asia-Pacific Optical and Wireless Communications : 16-18 October, 2002, Shanghai, China

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4906

Pub. Year:

2002

Page(from):

385

Page(to):

387

Pages:

3

Pub. info.:

Bellingham, Washington: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446954 [0819446955]

Language:

English

Call no.:

P63600/4906

Type:

Conference Proceedings

Details

TDL ID:	ZA00012755
Series ID:	PA00000029
Conf. info. (Name):	APOC : Asia Communications and Photonics
Conf. info. (Number):	2002
Conf. info. (Venue):	Shanghai, China
Conf. info. (Date):	2002.10.16-2002.10.18

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