Mesa or trench type for chromeless phase-shift lithography from photolithographic performance point of view

Mesa or trench type for chromeless phase-shift lithography from photolithographic performance point of view

Author(s):

Shi, X. ( ASML MaskTools, Inc. (USA) )

Chen, J.F.

Hsu, S.

Van Den Broeke, D.J.

Socha, R.J. ( ASML (USA) )

Chang, C.H. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

Dai, C.-M.

2 more

Publication title:

22nd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4889

Pub. Year:

2002

Vol.:

Part Two

Page(from):

1304

Page(to):

1312

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

Language:

English

Call no.:

P63600/4889

Type:

Conference Proceedings

Details

TDL ID:	ZA00012737
Series ID:	PA00000029
Conf. info. (Name):	Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	22nd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2002.10.01-2002.10.04

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