Preliminary study of 65-nm-node alternating phase-shift mask fabrication
- Author(s):
Hosono, K. ( Fujitsu Ltd. (Japan) ) Ishikawa, N. Asai, S. Maruyama, H. Miyahara, Y. Sasaki, S. ( Dai Nippon Printing Co., Ltd. (Japan) ) Yamashita, Y. Hotta, Y. Furukawa, T. Naito, M. Miyashita, H. Noguchi, S. - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1273
- Page(to):
- 1280
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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