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Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell

Author(s):
Lee, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Chung, D.-H.
Cha, D.-C.
Kim, H.-S.
Park, J.-S.
Nam, D.-G.
Woo, S.-K.
Cho, H.-S.
Han, W.-S.
4 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. date:
2002
Vol.:
Part Two
Page(from):
1253
Page(to):
1262
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

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