Application of chromeless phase lithography (CPL) masks in ArF lithography
- Author(s):
Kasprowicz, B.S. ( Photronics Inc. (USA) ) Progler, C.J. Wu, W. ( Motorola, Inc. (USA) ) Conley, W. Litt, L.C. Van Den Broeke, D.J. ( ASML Masktools Inc. (USA) ) Wampler, K.E. Socha, R.J. ( ASML (USA) ) - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1189
- Page(to):
- 1201
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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