Application of chromeless phase lithography (CPL) masks in ArF lithography

Application of chromeless phase lithography (CPL) masks in ArF lithography

Author(s):

Kasprowicz, B.S. ( Photronics Inc. (USA) )

Progler, C.J.

Wu, W. ( Motorola, Inc. (USA) )

Conley, W.

Litt, L.C.

Van Den Broeke, D.J. ( ASML Masktools Inc. (USA) )

Wampler, K.E.

Socha, R.J. ( ASML (USA) )

3 more

Publication title:

22nd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4889

Pub. Year:

2002

Vol.:

Part Two

Page(from):

1189

Page(to):

1201

Pages:

13

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

Language:

English

Call no.:

P63600/4889

Type:

Conference Proceedings

Details

TDL ID:	ZA00012737
Series ID:	PA00000029
Conf. info. (Name):	Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	22nd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2002.10.01-2002.10.04

Similar Items:

1 Conference Proceedings Defect printability in CPL mask technology Kuijten, J.-P., Verhappen, A., Pijnenburg, W., Conley, W., Litt, L.C., Wu, W., Montgomery, P., Roman, B.J., Kasprowicz, … SPIE - The International Society of Optical Engineering	7 Conference Proceedings Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering
2 Conference Proceedings CPL mask technology for sub-100-nm contact hole imaging Kasprowicz, B.S., Conley, W.E., Litt, L.C., Van Den Broeke, D.J., Montgomery, P.K., Socha, R.J., Wu, W., Lucas, K.D., … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering
3 Conference Proceedings The application of CPL reticle technology for the 0.045-mm node Conley, W., Van Den Broeke, D.J., Socha, R.J., Wu, W., Litt, L.C., Lucas, K.D., Roman, B.J., Peters, R.D., Parker, C., … SPIE - The International Society of Optical Engineering	9 Conference Proceedings The impact of MEEF through pitch for 120-nm contact holes Litt, L.C., Wu, W., Conley, W., Lucas, K.D., Roman, B.J., Montgomery, P., Kasprowicz, B.S., Progler, C.J., Socha, R.J., … SPIE - The International Society of Optical Engineering
4 Conference Proceedings CPL reticle technology for advanced device applications Conley, W.E., Van Den Broeke, D.J., Socha, R.J., Wu, W., Litt, L.C., Lucas, K.D., Roman, B.J., Peters, R.D., Parker, C., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL) Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., Hsu, S.D., Wampler, K.E., Socha, R.J., Petersen, J.S. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Application of CPL reticle technology for the 65- and 50-nm node Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., … SPIE-The International Society for Optical Engineering	11 Conference Proceedings Applications of CPL mask technology for sub-65nm gate imaging Litt, L. C., Conley, W., Wu, W., Peters, R., Parker, C., Cobb, J., Kasprowicz, B. S., van den Broeke, D., Park, J. C., … SPIE - The International Society of Optical Engineering
6 Conference Proceedings The impact of illumination on feature fidelity for CPL mask technology Kuijten, J. P., Verhappen, A., Conley, W., van de Goor, S., Litt, L., Wu, W., Lucas, K., Roman, B., Kasprowicz, B., … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL) Van Den Broeke, D.J., Socha, R., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., Shi, … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12