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Pattern displacement induced by lens aberrations

Author(s):
Hendrickx, E. ( IMEC vzw (Belgium) )
Vandenberghe, G.
Ronse, K.G.
Colina, A. ( ASML (Netherlands) )
van der Hoff, A.
Dusa, M.V.
Finders, J.
2 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. Year:
2002
Vol.:
Part Two
Page(from):
1155
Page(to):
1162
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

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