Image placement distortions in EPI masks

Image placement distortions in EPI masks

Author(s):

Thiel, C.W. ( IBM Microelectronics Div. (USA) )
Kindt, L.
Lawliss, M.

Publication title:

22nd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4889

Pub. Year:

2002

Vol.:

Part Two

Page(from):

1133

Page(to):

1142

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

Language:

English

Call no.:

P63600/4889

Type:

Conference Proceedings

Details

TDL ID:	ZA00012737
Series ID:	PA00000029
Conf. info. (Name):	Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	22nd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2002.10.01-2002.10.04

Similar Items:

1 Conference Proceedings Reduction of image placement errors in EPL masks (Invited Paper) II, O.R.W., Reu, P.L., Engelstad, R.L., Lovell, E.G., Lercel, M.J., Thiel, C.W., Lawliss, M.S., Mackay, R.S. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC Racette, K.C., Williams, C.T., Fisch, E., Kindt, L., Lawliss, M., Ackel, R., Lercel, M.J. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks Magg,C., Lercel,M.J., Lawliss,M., Ackel,R., Caldwell,N., Kindt,L., Racette,K.C., Williams,C., Reu,P.L. SPIE-The International Society for Optical Engineering	8 Conference Proceedings X-ray mask image-placement studies at the Microlithography Mask Development Center Puisto,D., Lawliss,M., Faure,T., rocque,J.M., Kimmel,K.R., Benoit,D.E. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Evaluation of image-placement distortion contributors of the EL-3+ electron-beam lithography system in x-ray mask fabrication D. Puisto, M. Lawliss Society of Photo-optical Instrumentation Engineers	9 Conference Proceedings Next-generation lithography mask development at the NGL-MCOC Lercel,M.J., Racette,K.C., Magg,C., Lawliss,M., Collins,K.W., Barrett,M., Trybendis,M.J., Bouchard,L. SPIE - The International Society for Optical Engineering
4 Conference Proceedings Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks Thiel, C., Racette, K.C., Fisch, E., Lawliss, M., Kindt, L., Huang, C., Ackel, R., Levy, M. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Next-generation lithography mask development at the NGL Mask Center of Competency Lercel,M.J., Brooks,C.J., Racette,K.C., Magg,C., Lawliss,M., Caldwell,N., Jeffer,R., Collins,K.W., Barrett,M., … SPIE - The International Society for Optical Engineering
5 Conference Proceedings EPL mask fabrication Lercel, M.J., Williams, C.T., Lawliss, M., Ackel, R., Kindt, L., Fisch, E. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Placement measurement and FE modeling results for distortion control of stencil masks Ehrmann,A., Struck,T., Kaesmaier,R., Haugeneder,E., Loschner,H., Butschke,J., Letzkus,F., Irmscher,M., Springer,R., … SPIE - The International Society for Optical Engineering
6 Conference Proceedings Mask availability for next-generation lithography Lercel, M.J., Fisch, E., Racette, K.C., Lawliss, M., Williams, C. T., Kindt, L., Huang, C. SPIE-The International Society for Optical Engineering	12 Conference Proceedings EUVL mask fabrication for the 45-nm node Fisch, E., Kindt, L., Lercel, M.J., Racette, K.C., Williams, C.T. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12