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Advanced FIB mask repair technology for 100-nm/ArF lithography

Author(s):
Hagiwara, R. ( Seiko Instruments, Inc. (Japan) )
Yasaka, A.
Aita, K.
Takaoka, O.
Koyama, Y.
Kozakai, T.
Doi, T.
Muramatsu, M.
Suzuki, K.
Sugiyama, Y.
Sawaragi, H.
Okabe, M.
Shinohara, S.
Hasuda, M.
Adachi, T.
Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
Nishiguchi, M.
Sato, Y.
Hayashi, N.
Ozawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Tanaka, Y.
Yoshioka, N.
17 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. date:
2002
Vol.:
Part Two
Page(from):
1056
Page(to):
1064
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

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