Partitioning of photomask processes for defects: II.
- Author(s):
- Howard, C.H. ( DuPont Photomasks, Inc. (USA) )
- Lamantia, M.J.
- Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1001
- Page(to):
- 1009
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Correlation of reticle defects detectability and repairs to ArF wafer printability for 0.13-μm design rule with binary OPC/SB mask
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Photomask defect tracing, analysis, and reduction with chemically amplified resist process
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
A study of defect measurement techniques and corresponding effects on the lithographic process window for a 193-nm EPSM photomask
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Threshold residual ion concentration on photomask surface to prevent haze defects
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
DEPOSITION OF HEAVILY-DOPED μc-SILICON THIN FILMS BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION PROCESS (remote PECVD)
Materials Research Society |
Trans Tech Publications |
SPIE - The International Society of Optical Engineering |