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Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Author(s):
Cho, S.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Ahn, W.-S.
Cho, W.-I.
Sung, M.-G.
Moon, S.-Y.
Choi, S.-W.
Yoon, H.-S.
Sohn, J.-M.
3 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. date:
2002
Vol.:
Part Two
Page(from):
964
Page(to):
971
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

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