Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process
- Author(s):
Cho, S.-Y. ( Samsung Electronics Co., Ltd. (South Korea) ) Ahn, W.-S. Cho, W.-I. Sung, M.-G. Moon, S.-Y. Choi, S.-W. Yoon, H.-S. Sohn, J.-M. - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 964
- Page(to):
- 971
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Evaluation of reticle cleaning performance with different drying methods for high-grade photomasks
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
A study of Cr to Mosi in situ dry etching process to reduce plasma induced defect [5992-25]
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
New method for approaching the loading-free process for photomask Cr etching
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
New approach for quartz dry etching using hardmask for sub-90-nm photomask technology
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Analysis of photomask distortion caused by blank materials and open ratios
SPIE-The International Society for Optical Engineering |