Blank Cover Image

Feasibility study of detectability and printability for TaSiOx

Author(s):
Nishiguchi, M. ( Dai Nippon Printing Co., Ltd. (USA) )
Morikawa, Y.
Motonaga, T.
Noguchi, K.
Sasaki, S.
Mohri, S.H.
Hoga, M.
Hayashi, N.
3 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. Year:
2002
Vol.:
Part Two
Page(from):
955
Page(to):
963
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Feasibility study of SCAAM-type Alt-PSM for 157-nm lithography

Morikawa, Y., Kokubo, H., Noguchi, K., Sasaki, S., Mohri, H., Hoga, M., Kanda, N., Irie, S., Watanabe, K., Suganaga, T., …

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Optimization of Alt-PSM structure for 100-nm-node ArF lithography: ＩＩ

Mesuda, K., Toyama, N., Narukawa, S., Morikawa, Y., Mohri, H., Hayashi, N., Hoga, M.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Study of mask process development for EUVL

Abe, T., Nishiguchi, M., Amano, T., Motonaga, T., Sasaki, S., Mohri, H., Hayashi, N., Tanaka, Y., Yamanashi, H., …

SPIE - The International Society of Optical Engineering
8 Conference Proceedings R-mask: a new concept and its application for small-volume production

Hayano, K., Hotta, S., Hasegawa, N., Hosono, K., Tanaka, T., Suko, K., Sasaki, S., Mohri, H., Hoga, M., Hayashi, N.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings PSM quartz etch depth evaluation with an atomic force microscope

Noguchi, K., Sasaki, S., Yoshida, Y., Adachi, T., Abe, T., Mohri, H., Kokubo, H., Morikawa, Y., Hayashi, N.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Photomask repair performance of the SiON/Ta-Hf attenuating PSM

Nishiguchi, M., Amano, T., Sasaki, S., Morikawa, Y., Hayashi, N.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Feasibility study of manufacturing process and quality control for the new alternating PSM structure

Morikawa,Y., Kokubo,H., Nishiguchi,M., Nara,M., Totsu,Y., Hoga,M., Hayashi,N.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Evaluation of dry etching and defect repair of EUVL mask absorber layer

Abe, T., Amano, T., Motonaga, T., Sasaki, S., Mohri, H., Hayashi, N., Tanaka, Y., Nishiyama, I.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Feasibility study of manufacturing process and quality control for the new alternatingPSM structure (BACUS Best Poster)

Morikawa, Y., Kokubo, H., Nishiguchi, M., Nara, M., Totsu, Y., Hoga, M., Hayashi, N.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings R-mask: simple and low-cost fabrication techniques

Fujii, A., Sasaki, S., Shimizu, M., Kobayashi, Y., Tominaga, T., Hoga, M., Mohri, H., Hayashi, N., Hayano, K., Hasegawa, …

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Defect printability analysis on alternating phase-shifting masks for 193-nm lithography

Morikawa, Y., Totsu, Y., Nishiguchi, M., Hoga, M., Hayashi, N., Pang, L., Luk-Pat, G.T.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Evaluation of OASIS. VSB (SEMI P44) for practical use [6283-58]

Kuriyama, K., Suzuki, T., Narukawa, S., Mohri, H., Hoga, M., Hayashi, N.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12