Simulation-based defect printability analysis on alternating phase-shifting masks for 193-nm lithography

Simulation-based defect printability analysis on alternating phase-shifting masks for 193-nm lithography

Author(s):

Pang, L. ( Numerical Technologies, Inc. (USA) )
Yu, Z. ( KLA-Tencor Corp. (USA) )
Luk-Pat, G.T. ( Numerical Technologies, Inc. (USA) )
Chen, J.X. ( DuPont Photomasks, Inc. (USA) )
Volk, W.W. ( KLA-Tencor Corp. (Japan) )

Publication title:

22nd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4889

Pub. Year:

2002

Vol.:

Part Two

Page(from):

947

Page(to):

954

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

Language:

English

Call no.:

P63600/4889

Type:

Conference Proceedings

Details

TDL ID:	ZA00012737
Series ID:	PA00000029
Conf. info. (Name):	Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	22nd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2002.10.01-2002.10.04

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