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Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes

Author(s):
Choi, Y.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, J.R.
Sung, M.-G.
Yang, S.-H.
Kim, S.-H.
Lee, H.-J.
Lee, J.-Y.
Jang, I.Y.
Kim, Y.H.
Choi, S.-W.
Yoon, H.-S.
Sohn, J.-M.
7 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. Year:
2002
Vol.:
Part Two
Page(from):
819
Page(to):
825
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

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