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Optimum PEC conditions under resist heating effect reduction for 90-nm-node mask writing

Author(s):
Park, E.S. ( Photronics-PKL (South Korea) )
Lee, J.H,
Park, D.I.
Jeong, W.-G.
Seo, S.K.
Kim, S.-S.
Choi, S.-S.
Jeong, S.-H.
3 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. date:
2002
Vol.:
Part Two
Page(from):
792
Page(to):
799
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

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