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Fogging effect consideration in mask process at 50-KeV e-beam systems

Author(s):
Yang, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, Y.-H.
Park, J.-R.
Kim, Y.-H.
Choi, S.-W.
Yoon, H.-S.
Sohn, J.-M.
2 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. date:
2002
Vol.:
Part Two
Page(from):
786
Page(to):
791
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

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