Blank Cover Image

Preserving EAPSM phase and transmission in the clean process

Author(s):
Choi, S.-J. ( Photronics-PKL (South Korea) )
Yoon, S.-Y.
Kim, Y.-D.
Lee, H.-W.
Kim, D.-H.
Lee, S.-W.
Lee, D.-H.
Kim, J.-M.
Choi, S.-S.
Jeong, S.H.
5 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. Year:
2002
Vol.:
Part One
Page(from):
713
Page(to):
724
Pages:
12
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Characteristics of residues and optical change of HT PSM during stepwise west cleaning and optimization of HT PSM cleaning process

Jeong, W.-G., Kim, D.-W., Park, C.-M., An, K.-W., Lee, D.-H., Kim, J.-M., Choi, S.-S., Jeong, S.H.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings The analysis of optical signal transmission characteristics in laser diodes [6124-49]

Kim, D.-G., Yoon, Y.-S., Kim, K-M., Lee, J.-J., Choi, Y.-W.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Etching selectivity and surface profile of attenuated phase-shifting mask using CF4/O2/He inductively coupled plasma (ICP)

Yoon, S.-Y., Choi, S.-J., Kim, Y.-D., Lee, D.-H., Cha, H.-S., Kim, J.-M., Choi, S.-S., Jeong, S.H.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Comparative evaluation of mask cleaning performance

Jeong, W.-G., Park, D.-, Park, E.-S., Cho, Y.-W., Choi, S.-J., Kwon, H.-J., Kim, J.-M., Choi, S.-S.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Evaluation of reticle cleaning performance with different drying methods for high-grade photomasks

Jeong,W.G., Lee,S.W., Kim,D.H., Yoon,Y.J., Lee,D.H., Choi,B.Y., Choi,S.-S., Jung,S.M., Jeong,S.-H.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings The feasibility study of thin Cr film for low process bias

Seo, W.-W., Yoon, S.-Y., Park, D.-I., Park, E.-S., Kim, J.-M., Jeong, S.-M., Choi, S.-S., Cha, H.-S., Nam, K.S.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures

Choi, S.-J., Cha, H.-S., Yoon, S.-Y., Kim, Y.-D., Lee, D.-H., Kim, J.-M., Kim, J.-S., Min, D.-S., Jang, P.-J., Chang, …

SPIE-The International Society for Optical Engineering
10 Conference Proceedings An electrical model of VCSEL as optical transmitter for optical printed circuit board

Kim, D.-K., Yoon, Y.-S., Choi, J.-H., Kim, K.-M., Choi, Y.-W., Lee, S.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Comparative evaluation of mask production CAR development processes with stepwise defect inspection

Jeong, W.-G., Lee, J.-K., Park, D.I., Park, E.-S., Lee, J.-H., Seo, S.-K., Lee, D.-H., Kim, J.-M., Choi, S.S., Jeong, …

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Phase-shifted assist feature OPC for sub-45-nm node optical lithography

G. Yoon, H. Kim, J. Lee, S. Choi, W. Han

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Parameters affecting megasonic power transmittance in the megasonic cleaning process

Kim,Y.H., Park,J.H., Lee,K.H., Choi,S.W., Yoon,H.S., Sohn,J.M.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings 90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process

Park, D.-I., Seo, S.-K., Park, E.-S., Lee, J.-H., Jeong, W.-G., Kim, J.-M., Choi, S.-S., Jeong, S.-H.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12