Study of the role of Cl2, O2, and He in the chrome etch process with optical emission spectroscopy
- Author(s):
- Anderson, R.B. ( Etec Systems, Inc., An Applied Materials Co. (USA) )
- Ruhl, G. ( Infineon Technologies AG (Germany) )
- Sandlin, N.L. ( Etec Systems, Inc., An Applied Materials Co. (USA) )
- Buie, M.J.
- Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 641
- Page(to):
- 652
- Pages:
- 12
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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