90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process
- Author(s):
Park, D.-I. ( Photronics-PKL (South Korea) ) Seo, S.-K. Park, E.-S. Lee, J.-H. Jeong, W.-G. Kim, J.-M. Choi, S.-S. Jeong, S.-H. - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 634
- Page(to):
- 640
- Pages:
- 7
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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