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90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process

Author(s):
Park, D.-I. ( Photronics-PKL (South Korea) )
Seo, S.-K.
Park, E.-S.
Lee, J.-H.
Jeong, W.-G.
Kim, J.-M.
Choi, S.-S.
Jeong, S.-H.
3 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. date:
2002
Vol.:
Part One
Page(from):
634
Page(to):
640
Pages:
7
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

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