Tuning MEEF for CD control at 65-nm node based on chromeless phase lithography (CPL)
- Author(s):
Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) ) Laidig, T.L. Wampler, K.E. Hsu, S. Shi, X. Hsu, M. Burchard, P. Chen, J.F. - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 579
- Page(to):
- 591
- Pages:
- 13
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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