Manufacturability evaluation of model-based OPC masks

Manufacturability evaluation of model-based OPC masks

Author(s):

Jang, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )

Oh, Y.-H. ( Wonkwang Univ. (South Korea) )

Lee, J.-C.

Lim, S.

6 more

Publication title:

22nd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4889

Pub. Year:

2002

Vol.:

Part One

Page(from):

520

Page(to):

529

Pages:

10

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

Language:

English

Call no.:

P63600/4889

Type:

Conference Proceedings

Details

TDL ID:	ZA00012736
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2002 : 22nd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2002.10.011-2002.10.04

Similar Items:

1 Conference Proceedings Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes Choi, Y.-H., Park, J.R., Sung, M.-G., Yang, S.-H., Kim, S.-H., Lee, H.-J., Lee, J.-Y., Jang, I.Y., Kim, Y.H., Choi, … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Analytical approach to X-phenomenon in alternating phase-shifting masks Park, J.R., Kim, S.-H., Lee, H.-J., Jang, I.-Y., Choi, Y.-H., Yang, S.-H., Lee, Y.-H., Kim, Y.-H., Choi, S.-W., Yoon, … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Evaluation of lens aberrations depending on the transmittance of DUV-attenuated PSM Park,J.-H., Kim,Y.-H., Lim,S.-C., Lee,K.-H., Choi,S.-W., Yoon,H.-S., Sohn,J.-M. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Effect of beam blur in mask fabrication Yang,S.-H., Ki,W.-T., Moon,S.-Y., Jeong,T.-M., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Dose latitude dependency on resist contrast in e-beam mask lithography Cha,B.-C., Moon,S.-Y., Ki,W.-T., Yang,S.-H., Choi,S.-W., Han,W.-S., Yoon,H.-S., Sohn,J.-M. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Ecperimental study on the possibility of chemically amplified resists for mask production for device generations < 180 nm Kim,C.-H., Jeon,C.-U., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Development of mask-making process for CLM manufacturing technology Park, J.-H., Chung, D.-H., Lee, M.-K., Shin, I.-K., Choi, S.-W., Yoon, H.-S., Sohn, J.-M., Chen, J.F., Van Den Broeke, … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Vacuum delay effect of CAR in mask fabrication Kim,C.-H., Jeon,C.-U., Han,S.-J., Cho,W.-I., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Effect of mask reduction ratio in alternating phase-shift masks Shin,I.-G., Lee,S.-W., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M., Lim,T.-K. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Analysis of photomask CD errors depending on development methods Moon,S.-Y., Ki,W.-T., Cha,B.-C., Choi,S.-W., Yoon,H.-S., Sohn,J.-M. SPIE - The International Society for Optical Engineering
6 Conference Proceedings Simulation of mask CD variation for different local densities with in-house developed e-beam lithography simulator Kim, M.-Y., Ki, W.-T., Lee, S.-H., Choi, J.-H., Choi, S.-W., Sohn, J.-M. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Fast topography simulation using differential method Zinn, S.Y., Kim, S.-H., Choi, S.-W., Sohn, J.-M. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12