Characterization of repairs to KrF 300-mm wafer printability for 0.13-pm design rule with attenuated phase-shifting mask
- Author(s):
Chou, W. ( United Microelectronics Corp. (Taiwan)Tseng, ) Chen, T. Tseng, W. Huang, P. Tseng, C.C. ( DuPont Photomasks Taiwan Ltd. (Taiwan) ) Chung, M. Wang, D. Huang, N. - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 498
- Page(to):
- 508
- Pages:
- 11
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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