PMJ 2002 Panel Discussion Review: Lithography strategy from 90- to 65-nm nodes - ArF, F2, or EPL? (Invited Paper)

PMJ 2002 Panel Discussion Review: Lithography strategy from 90- to 65-nm nodes - ArF, F₂, or EPL? (Invited Paper)

Author(s):

Tanabe, H. ( Elpida Memory, Inc. (Japan) )
Nagaoka, Y. ( KLA-Tencor Japan Ltd. (Japan) )

Publication title:

22nd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4889

Pub. Year:

2002

Vol.:

Part One

Page(from):

437

Page(to):

449

Pages:

13

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

Language:

English

Call no.:

P63600/4889

Type:

Conference Proceedings

Details

TDL ID:	ZA00012736
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2002 : 22nd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2002.10.011-2002.10.04

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