Reliable subnanometer repeatability for CD metrology in a reticle production environment

Reliable subnanometer repeatability for CD metrology in a reticle production environment

Author(s):

Hourd, A.C. ( Compugraphics International Ltd. (UK) )

Grimshaw, A.

Scheuring, G. ( MueTec GmbH (Germany) )

Chen, S.-B. ( Taiwan Mask Corp. (Taiwan) )

Chen, P.W.

Jonckheere, R.M. ( IMEC vzw (Belgium) )

Philipsen, V.

Hartmann, M. ( PDF Solutions GmbH (Germany) )

Ordynskyy, V.

Peter, K.

Schaetz,T. ( Infineon Technologies AG (Germany) )

Sommer, K. ( Karl Sommer Consulting (Germany) )

11 more

Publication title:

22nd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4889

Pub. Year:

2002

Vol.:

Part One

Page(from):

319

Page(to):

327

Pages:

9

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

Language:

English

Call no.:

P63600/4889

Type:

Conference Proceedings

Details

TDL ID:	ZA00012736
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2002 : 22nd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2002.10.011-2002.10.04

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