![Blank Cover Image](/journaldocs/sites/all/modules/xc/xc_search/images/blank_cover/conference_proceedings.png)
Reliable subnanometer repeatability for CD metrology in a reticle production environment
- Author(s):
Hourd, A.C. ( Compugraphics International Ltd. (UK) ) Grimshaw, A. Scheuring, G. ( MueTec GmbH (Germany) ) Gittinger, C. Doebereiner, S. Hillmann, F. Brueck, H.-J. Chen, S.-B. ( Taiwan Mask Corp. (Taiwan) ) Chen, P.W. Jonckheere, R.M. ( IMEC vzw (Belgium) ) Philipsen, V. Hartmann, M. ( PDF Solutions GmbH (Germany) ) Ordynskyy, V. Peter, K. Schaetz,T. ( Infineon Technologies AG (Germany) ) Sommer, K. ( Karl Sommer Consulting (Germany) ) - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 319
- Page(to):
- 327
- Pages:
- 9
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
Similar Items:
1
![]() SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
![]() SPIE-The International Society for Optical Engineering |
8
![]() SPIE - The International Society of Optical Engineering |
3
![]() SPIE-The International Society for Optical Engineering |
9
![]() Society of Photo-optical Instrumentation Engineers |
4
![]() SPIE-The International Society for Optical Engineering |
10
![]() SPIE-The International Society for Optical Engineering |
5
![]() SPIE-The International Society for Optical Engineering |
11
![]() SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |