Analysis of the impact of reticle CD variations on the available process windows for a 100-nm CMOS process

Analysis of the impact of reticle CD variations on the available process windows for a 100-nm CMOS process

Author(s):

Publication title:

22nd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4889

Pub. Year:

2002

Vol.:

Part One

Page(from):

197

Page(to):

208

Pages:

12

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

Language:

English

Call no.:

P63600/4889

Type:

Conference Proceedings

Details

TDL ID:	ZA00012736
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2002 : 22nd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2002.10.011-2002.10.04

Similar Items:

1 Conference Proceedings Reticle quality needs for advanced 193-nm lithography Jonckheere,R.M., Vandenberghe,G.N., Wiaux,V., Verhaegen,S., Ronse,K. SPIE-The International Society for Optical Engineering	7 Conference Proceedings OPC aware mask and wafer metrology Maurer, W., Wiaux, V., Jonckheere, R.M., Philipsen, V., Hoffmann, T., Verhaegen, S., Ronse, K.G., England, J.G., Howard, … SPIE-The International Society for Optical Engineering
2 Conference Proceedings (Sub-) 100-nm gate patterning using 248-nm alternating PSM Vandenberghe,G.N., Jaenen,P., Jonckheere,R.M., Ronse,K., Toublan,O. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results Hourd, A.C., Grimshaw, A., Scheuring, G., Gittinger, C., Brueck, H.-J., Chen, S.-B., Chen, P.W., Hartmann, H., … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum UV cleaning Okoroanyanwu, U., Stepanenko, N., Vereecke, G., Eliat, A., Kocsis, M.K., Kang, Y.S., Jonckheere, R.M., Conard, T., … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Implementation of 248-nm based CD metrology for advanced reticle production Hourd, A.C., Grimshaw, A., Scheuring, G., Gittinger, C., Doebereiner, S., Hillmann, F., Brueck, H.-J., Hartmann, H., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings CD control for two-dimensional features in future technology nodes Verhaegen,S., Gordon,R.L., Jonckheere,R.M., McCallum,M., Ronse,K. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Assessment of OPC effectiveness using two-dimensional metrics Wiaux, V., Philipsen, V., Jonckheere, R., Vandenberghe, G., Verhaegen, S., Hoffmann, T., Ronse, K., Howard, W.B., … SPIE-The International Society for Optical Engineering
5 Conference Proceedings Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM Kim,Y.-C., Vandenberghe,G.N., Verhaegen,S., Ronse,K. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Role of LV-SEM reticle CD measurements on DUV lithography Thomas Marschner, Ivan K. Pollentier, Goedele Potoms, Rik M. Jonckheere, Kurt G. Ronse SPIE - The International Society of Optical Engineering
6 Conference Proceedings Model-based OPC for first-generation 193-nm lithography Lucas,K.D., Word,J.C., Vandenberghe,G.N., Verhaegen,S., Jonckheere,R.M. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future R. Jonckheere, G. F. Lorusso, A. Goethals, K. Ronse, J. Hermans, R. D. Ruyter SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12