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Development of new stream format with GDSII upper compatibility and high compression rate

Author(s):
Kuriyama, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Hirumi, J.
Yoshioka, N.
Hojo, Y. ( Hitachi High-Technologies Corp. (Japan) )
Kawase, Y. ( JEOL Ltd. (Japan) )
Hara, S. ( NuFlare Technology Inc. (Japan) )
Hoga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Watanabe, S.W.
Inoue, M. ( Seiko Instruments Inc. (Japan) )
Kawase, H.
Kamimoto, T.
6 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. Year:
2002
Vol.:
Part One
Page(from):
83
Page(to):
93
Pages:
11
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

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