Back to square 9: a demonstration of 9-in. reticle capability

Back to square 9: a demonstration of 9-in. reticle capability

Author(s):

Cummings, K.D. ( ASML (USA) )

Schneider-Stoermann, L.U. ( Schott Lithotec AG (Germany) )

Buttgereit, U.

Irmscher, M. ( Institut fuer Mikroelektronik Stuttgart (Germany) )

Mueller, D.

Hudek, P. ( Leica Microsystems Lithography GmbH (Germany) )

Beyer, D.

Brendel, B.

Whittey, J.M.

Eynon, B.G. ( Photronics Inc. (USA) )

Harsch, J.

Constantine, C. ( Unaxis USA, Inc. (USA) )

Miller, K. ( Veeco Instruments (USA) )

8 more

Publication title:

22nd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4889

Pub. Year:

2002

Vol.:

Part One

Page(from):

15

Page(to):

24

Pages:

10

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

Language:

English

Call no.:

P63600/4889

Type:

Conference Proceedings

Details

TDL ID:	ZA00012736
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2002 : 22nd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2002.10.011-2002.10.04

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