Overview of optical systems for 30-nm-resolution lithography at EUV wavelenghts (Invited Paper)
- Author(s):
- Hudyma, R.M. ( Paragon Optics, Inc. (USA) )
- Publication title:
- International optical design conference 2002 : 3-5 June, 2002, Tucson, Arizona, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4832
- Pub. Year:
- 2002
- Page(from):
- 137
- Page(to):
- 148
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446084 [0819446084]
- Language:
- English
- Call no.:
- P63600/4832
- Type:
- Conference Proceedings
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