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Laser-induced shock wave removal of chemical-mechanical polishing slurries from silicon wafers

Author(s):
Lee, J.M. ( IMT Co. Ltd. (South Korea) )
Cho, S.H.
Park, J.G. ( Hanyang Univ. (South Korea) )
Lee, S.H.
Han, Y.P. ( Samsung Electronics Co. Ltd. (South Korea) )
Kim, S.Y.
1 more
Publication title:
Third International Symposium on Laser Precision Microfabrication : proceedings : 27-31 May, 2002, Osaka, Japan
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4830
Pub. date:
2003
Page(from):
287
Page(to):
289
Pages:
3
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446015 [0819446017]
Language:
English
Call no.:
P63600/4830
Type:
Conference Proceedings

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