Use of deep reactive ion etching in the fabrication of high-efficiency high-resolution crystal x-ray analyzers
- Author(s):
Shew, B.-Y. ( Synchrotron Radiation Research Ctr. (Taiwan) ) Huang, R.-S. ( Tsing Hua Univ. (Taiwan) ) Wang, D.-J. ( Synchrotron Radiation Research Ctr. (Taiwan) ) Perng, S.-Y. Kuan, C.-K. Cai, Y.Q. Chow, P.C. Schwoerer-Boehning, M. ( Argonne National Lab. (USA) ) Caliebe, W. ( Brookhaven National Lab. (USA) ) Kao, C.-C. Chen, C.T. ( Synchrotron Radiation Research Ctr. (Taiwan) ) - Publication title:
- Design and microfabrication of novel x-ray optics : 9 July 2002, Seattle, Wasington, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4783
- Pub. Year:
- 2002
- Page(from):
- 131
- Page(to):
- 138
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445506 [0819445509]
- Language:
- English
- Call no.:
- P63600/4783
- Type:
- Conference Proceedings
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