Heat stability of Mo/Si multilayers inserted with silicon oxide layers

Heat stability of Mo/Si multilayers inserted with silicon oxide layers

Author(s):

Ishino, M. ( Japan Atomic Energy Research Institute (Japan) )
Yoda, O.
Sano, K. ( Japan Atomic Energy Research Institute (Japan) )
Koike, M. ( Japan Atomic Energy Research Institute (Japan) )

Publication title:

X-ray mirrors, crystals, and multilayers II : 10-11 July 2002, Seattle, Washington, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4782

Pub. Year:

2002

Page(from):

277

Page(to):

284

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445490 [0819445495]

Language:

English

Call no.:

P63600/4782

Type:

Conference Proceedings

Details

TDL ID:	ZA00012619
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : X-Ray Mirrors, Crystals, and Multilayers
Conf. info. (Number):	2002 : 2nd
Conf. info. (Venue):	Seattle, WA, USA
Conf. info. (Date):	2002.07.10-2002.07.11

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