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Reflectometry-based approaches for in-situ monitoring of etch depths in plasma etching processes

Author(s):
Publication title:
Advanced characterization techniques for optical, semiconductor, and data storage components : 9-11 July 2002 Seattle, Washington, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4779
Pub. Year:
2002
Page(from):
98
Page(to):
106
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445469 [0819445460]
Language:
English
Call no.:
P63600/4779
Type:
Conference Proceedings

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