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OPC aware mask and wafer metrology

Author(s):
Maurer, W. ( KLA-Tencor Corp. (USA) )
Wiaux, V. ( IMEC (Belgium) )
Jonckheere, R.M.
Philipsen, V.
Hoffmann, T.
Verhaegen, S.
Ronse, K.G.
England, J.G. ( KLA-Tencor Corp. (USA) )
Howard, W.B.
4 more
Publication title:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4764
Pub. date:
2002
Page(from):
175
Page(to):
181
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445315 [0819445312]
Language:
English
Call no.:
P63600/4764
Type:
Conference Proceedings

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