
OPC aware mask and wafer metrology
- Author(s):
Maurer, W. ( KLA-Tencor Corp. (USA) ) Wiaux, V. ( IMEC (Belgium) ) Jonckheere, R.M. Philipsen, V. Hoffmann, T. Verhaegen, S. Ronse, K.G. England, J.G. ( KLA-Tencor Corp. (USA) ) Howard, W.B. - Publication title:
- 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4764
- Pub. Year:
- 2002
- Page(from):
- 175
- Page(to):
- 181
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445315 [0819445312]
- Language:
- English
- Call no.:
- P63600/4764
- Type:
- Conference Proceedings
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