OPC aware mask and wafer metrology

OPC aware mask and wafer metrology

Author(s):

Maurer, W. ( KLA-Tencor Corp. (USA) )

Wiaux, V. ( IMEC (Belgium) )

England, J.G. ( KLA-Tencor Corp. (USA) )

Howard, W.B.

4 more

Publication title:

18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4764

Pub. date:

2002

Page(from):

175

Page(to):

181

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445315 [0819445312]

Language:

English

Call no.:

P63600/4764

Type:

Conference Proceedings

Details

TDL ID:	ZA00012602
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2002 : 18th
Conf. info. (Venue):	Munich, Germany
Conf. info. (Date):	2002.01.15-2002.01.16

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