Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results

Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results

Author(s):

Hourd, A.C. ( Compugraphics International Ltd. (UK) )

Grimshaw, A.

Scheuring, G. ( MueTec GmbH (Germany) )

Gittinger, C.

Brueck, H.-J.

Chen, S.-B. ( Taiwan Mask Corp )

Chen, P.W.

Hartmann, H. ( PDF Solutions GmbH (Germany) )

Ordynskyy, V.

Jonckheere, R.M. ( IMEC vzw (Belgium) )

Philipsen, V.

Schaetz, T. ( Infineon Technologies AG (Geramny) )

Sommer, K. ( Karl Sommer consulting (Germany) )

8 more

Publication title:

18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4764

Pub. Year:

2002

Page(from):

168

Page(to):

174

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445315 [0819445312]

Language:

English

Call no.:

P63600/4764

Type:

Conference Proceedings

Details

TDL ID:	ZA00012602
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2002 : 18th
Conf. info. (Venue):	Munich, Germany
Conf. info. (Date):	2002.01.15-2002.01.16

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