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Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results

Author(s):
Hourd, A.C. ( Compugraphics International Ltd. (UK) )
Grimshaw, A.
Scheuring, G. ( MueTec GmbH (Germany) )
Gittinger, C.
Brueck, H.-J.
Chen, S.-B. ( Taiwan Mask Corp )
Chen, P.W.
Hartmann, H. ( PDF Solutions GmbH (Germany) )
Ordynskyy, V.
Jonckheere, R.M. ( IMEC vzw (Belgium) )
Philipsen, V.
Schaetz, T. ( Infineon Technologies AG (Geramny) )
Sommer, K. ( Karl Sommer consulting (Germany) )
8 more
Publication title:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4764
Pub. date:
2002
Page(from):
168
Page(to):
174
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445315 [0819445312]
Language:
English
Call no.:
P63600/4764
Type:
Conference Proceedings

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