Printability of hard and soft defects in 193-nm lithography

Printability of hard and soft defects in 193-nm lithography

Author(s):

Philipsen, V. ( IMEC (Belgium) )
Jonckheere, R.M.
Kohlpoth S. ( Infineon Technologies AG (Germany) )
Friedrich, C.M.
Torres, J.A. ( ASML MaskTools (USA) )

Publication title:

18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4764

Pub. Year:

2002

Page(from):

95

Page(to):

111

Pages:

17

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445315 [0819445312]

Language:

English

Call no.:

P63600/4764

Type:

Conference Proceedings

Details

TDL ID:	ZA00012602
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2002 : 18th
Conf. info. (Venue):	Munich, Germany
Conf. info. (Date):	2002.01.15-2002.01.16

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