Plasma etch of Cr masks utilizing TCP source for a next-generation plasma source

Plasma etch of Cr masks utilizing TCP source for a next-generation plasma source

Author(s):

Kwon, H.-J. ( PKL Corp. (Korea) )

Publication title:

18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4764

Pub. Year:

2002

Page(from):

60

Page(to):

65

Pages:

6

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445315 [0819445312]

Language:

English

Call no.:

P63600/4764

Type:

Conference Proceedings

Details

TDL ID:	ZA00012602
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2002 : 18th
Conf. info. (Venue):	Munich, Germany
Conf. info. (Date):	2002.01.15-2002.01.16

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