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Plasma etch of Cr masks utilizing TCP source for a next-generation plasma source

Author(s):
Kwon, H.-J. ( PKL Corp. (Korea) )
Min, D.-S.
Jang, P.-J.
Chang, B.-S.
Choi, B.-Y.
Jeong, S.-H.
1 more
Publication title:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4764
Pub. date:
2002
Page(from):
60
Page(to):
65
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445315 [0819445312]
Language:
English
Call no.:
P63600/4764
Type:
Conference Proceedings

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