Mask availability for next-generation lithography

Mask availability for next-generation lithography

Author(s):

Lercel, M.J. ( Photronics, Inc. (USA) )

Fisch, E. ( IBM (USA) )

Publication title:

18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4764

Pub. Year:

2002

Page(from):

18

Page(to):

22

Pages:

5

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445315 [0819445312]

Language:

English

Call no.:

P63600/4764

Type:

Conference Proceedings

Details

TDL ID:	ZA00012602
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2002 : 18th
Conf. info. (Venue):	Munich, Germany
Conf. info. (Date):	2002.01.15-2002.01.16

Similar Items:

1 Conference Proceedings Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC Racette, K.C., Williams, C.T., Fisch, E., Kindt, L., Lawliss, M., Ackel, R., Lercel, M.J. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks Thiel, C., Racette, K.C., Fisch, E., Lawliss, M., Kindt, L., Huang, C., Ackel, R., Levy, M. SPIE-The International Society for Optical Engineering
2 Conference Proceedings EUVL mask fabrication for the 45-nm node Fisch, E., Kindt, L., Lercel, M.J., Racette, K.C., Williams, C.T. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Characterization and etching of sputter-deposited absorber films for extreme ultraviolet lithography (EUVL) masks Racette,K.C., Williams,C.T., Lercel,M.J. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Next-generation lithography mask development at the NGL-MCOC Lercel,M.J., Racette,K.C., Magg,C., Lawliss,M., Collins,K.W., Barrett,M., Trybendis,M.J., Bouchard,L. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication Magg,C., Lercel,M.J., Lawliss,M., Kwong,R.W., Huang,W.-S., Angelopoulos,M. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks Magg,C., Lercel,M.J., Lawliss,M., Ackel,R., Caldwell,N., Kindt,L., Racette,K.C., Williams,C., Reu,P.L. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Image size control in next generation lithography masks Lercel,M.J., Magg,C. SPIE - The International Society for Optical Engineering
5 Conference Proceedings EPL mask fabrication Lercel, M.J., Williams, C.T., Lawliss, M., Ackel, R., Kindt, L., Fisch, E. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Advanced refractory-metal and process technology for the fabrication of x-ray masks Brooks,C.J., Racette,K.C., Lercel,M.J., Powers,L.A., Benoit,D.E. SPIE - The International Society for Optical Engineering
6 Conference Proceedings Next-generation lithography mask development at the NGL Mask Center of Competency Lercel,M.J., Brooks,C.J., Racette,K.C., Magg,C., Lawliss,M., Caldwell,N., Jeffer,R., Collins,K.W., Barrett,M., … SPIE - The International Society for Optical Engineering	12 Conference Proceedings Characterization of binary and attenuated phase shift mask blanks for 32nm mask fabrication T. Faure, E. Gallagher, M. Hibbs, L. Kindt, K. Racette Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12