Smart masks for next-generation lithography
- Author(s):
- Huston, D.R. ( Univ. of Vermont (USA) )
- Sautera, W. ( IBM Microelectronics (USA) )
- Publication title:
- European workshop on smart structures in engineering and technology : 21-23 May 2002, Presqu'île de Giens, France
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4763
- Pub. Year:
- 2003
- Page(from):
- 207
- Page(to):
- 212
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445292 [0819445290]
- Language:
- English
- Call no.:
- P63600/4763
- Type:
- Conference Proceedings
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